Ab initio study of the surface properties and ideal strength of (100) silicon thin films
نویسندگان
چکیده
Yoshitaka Umeno,1,2,* Akihiro Kushima,2 Takayuki Kitamura,2 Peter Gumbsch,1,3 and Ju Li4 1IZBS, University of Karlsruhe, Kaiserstrasse 12, 76131 Karlsruhe, Germany 2Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan 3Fraunhofer IWM, Wöhlerstrasse 11, 79108 Freiburg, Germany 4Department of Materials Science and Engineering, Ohio State University, Columbus, Ohio 43210, USA Received 2 June 2005; revised manuscript received 23 August 2005; published 31 October 2005
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